ALD on High-Aspect Ratio Structures

Synkera has extensive expertise in deposition of thin films via Atomic Layer Deposition (ALD) in high-aspect ratio structures such as the nanopores of anodic aluminum oxide (AAO). We have a custom-built ALD system onsite that is capable of deposition of a number of materials relevant to chemical sensing, energy conversion and catalysis. Please contact us if you have a particular application in mind.

Schematic illustration of ALD

ALD is a gas-based, surface-driven deposition technique that is uniquely suited to coating ultrahigh aspect ratio structures, such as nanopores in AAO, enabling precise control of the coatings thickness and composition.

ALD coatings are available with thicknesses ranging from 1 to 10 nm, conformally covering AAO pores with aspect ratio (length to diameter) as high as 5,000. Nanolaminates, where the deposition is cycled between two or more chemistries, resulting in alternating layers of different compositions, are also available

Currently available ALD coatings:

Standard options: Al₂O₃, ZnO, TiO₂, conductive Al-doped ZnO
Custom Options: GaN, Ga₂O₃, In₂O₃, nanolaminates

Functionality of coatings:

Sealing materials: Al₂O₃, ZnO
Conductive coatings to specified resistance: Al-doped ZnO


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